Can Silicon and Carbon Be Cleaned Without Etching?

[osskall]

Hi! Is silicon inert? i.e. can I clean it from deposited films with e.g. HNO3 and H2SO4 without etching the silicon itself? What about amorphous carbon?

 

[DrMark]

Common etches for Si are HF and caustics (NaOH, KOH). Nitric or sulfuric acid should be fine for cleaning it. Amorphous carbon electrodes I used to physically etch with "sandpaper" and routinely used them in HCLO₄, HCl, HNO₃ etc.

 

[ravenprp]

Yes, it is possible to clean silicon and carbon without etching them. Silicon itself is relatively inert and can be cleaned with mild acids such as HNO3 and H2SO4 without causing any etching. However, it is important to use a diluted solution and monitor the cleaning process carefully to avoid any potential damage to the silicon surface.

As for amorphous carbon, it can also be cleaned without etching using a similar method. However, the cleaning process may need to be adjusted depending on the type of carbon deposit and the surface it is on. For example, if the carbon is highly graphitic, a stronger acid may be needed to remove it completely.

In general, it is always best to test a small area before attempting to clean a larger surface to ensure that the cleaning solution does not cause any unwanted etching. Additionally, using a gentle cleaning method such as ultrasonic cleaning can also help to minimize the risk of etching.