Stack Effect in CMOS Design: Threshold Voltage Impact

In summary, the stack effect in CMOS design refers to the use of two or more transistors in series, which can affect the threshold voltages of the transistors. In a two-input NAND gate, the Vt of the top NMOS would increase when the bottom NMOS is turned on, due to the higher source voltage. However, this effect would only occur during transitions when the bottom NMOS is on, as when it is off, the top NMOS would also be grounded and the stack effect would not have an impact on Vt. The context of this conversation is regarding the application of the stack effect on Vt for a two-input NAND gate.
  • #1
johndoe
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What is stack effect in cmos design and how would it affect the threshold voltages?
 
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  • #2
This sounds somewhat like a HW question.
A "stack" is just two or more transistors in series. So think of a standard CMOS inverter but with two NMOS gates in series on the bottom half. Can you determine how doing that would effect the threshold of each transistor? Pay close attention to Vsb.
 
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  • #3
es1 said:
This sounds somewhat like a HW question.
A "stack" is just two or more transistors in series. So think of a standard CMOS inverter but with two NMOS gates in series on the bottom half. Can you determine how doing that would effect the threshold of each transistor? Pay close attention to Vsb.

Ok with two nmos in series, assuming their body is both grounded, Vt of the top nmos would increase since when a gate voltage is applied to the bot nmos, the source voltage (Vs) of the top nmos will be at a voltage Vgs higher than its body.

But here comes the question, such a 'stack effect' with the increase in Vt of the first nmos would only happen when the bot nmos is turned on right?
 
  • #4
johndoe said:
Ok with two nmos in series, assuming their body is both grounded, Vt of the top nmos would increase since when a gate voltage is applied to the bot nmos, the source voltage (Vs) of the top nmos will be at a voltage Vgs higher than its body.

But here comes the question, such a 'stack effect' with the increase in Vt of the first nmos would only happen when the bot nmos is turned on right?

What is the context of your question? What is the application?
 
  • #5
berkeman said:
What is the context of your question? What is the application?

The stack effect on Vt for a two input NAND gate. (2 nmos in series for pull down) If I am understanding correctly, the Vt for the nmos on top would increase only during transitions where the bot nmos is on? cause if the bot nmos is off, the top nmos would also be grounded and stack effect would not have any effect on vt?
 

Related to Stack Effect in CMOS Design: Threshold Voltage Impact

1. What is the stack effect in CMOS design?

The stack effect, also known as the short channel effect, is a phenomenon in CMOS design where the threshold voltage of a transistor decreases as the channel length gets shorter. This can cause performance and reliability issues in integrated circuits.

2. How does the stack effect impact the threshold voltage?

The stack effect causes the threshold voltage to decrease due to the increased electric field in the channel region as the channel length decreases. This leads to a decrease in the transistor's switching threshold, making it more susceptible to noise and other disturbances.

3. What are the consequences of the stack effect in CMOS design?

The stack effect can lead to various consequences, such as increased leakage current, reduced noise margins, and reduced reliability and lifespan of the integrated circuit. It can also affect the performance and speed of the circuit.

4. How can the stack effect be mitigated in CMOS design?

There are several techniques that can be used to mitigate the stack effect in CMOS design. These include using thicker gate oxides, implementing channel doping gradients, introducing lightly-doped drain (LDD) structures, and using different gate materials.

5. What are some current research efforts to address the stack effect in CMOS design?

Current research efforts are focused on developing new materials, such as high-k dielectrics, to replace traditional gate oxides and improve transistor performance. Other approaches include using non-planar transistor architectures, such as FinFETs, to reduce the effects of the stack effect.

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