Thanks for your help. I am using the ATR method and once I get back into the lab next week I plan on growing thicker films and depositing a silicon wafer.
I am working on my thesis for my masters in physics, and am running into some issues while trying to gather an IR spectrum of my hydrogenated amorphous silicon (a-Si:H). I am depositing my films using PECVD onto a glass microscope slide substrate. The films I have used so far have been 0.2-0.4...